Focused Ion Beams. Present Status of Focused Ion Beam.

Focused Ion Beam Lithography

Focused Ion Beam Microscopy and Micromachining

The FIB Instrument The basic functions of the FIB, namely, imaging and sputtering with an ion beam, require a highly focused beam. A consistent tenet of any focused beam is that the smaller the effective source size, the more current that can be focused to a point. Unlike the broad ion beams generated from plasma sources, high-resolution ion beams are defined by the use of a field ionization so...

Sculpting on polymers using focused ion beam

Available online 13 June 2008 It has been recently shown t

Nanoimprint Mold Manufacturing with Focused Ion Beam

Nanoimprint lithography (NIL) is an emerging low cost technique for reproducing sub-45 nm pattern in various applications; however, manufacturing the mold for nanoimprint has been a key challenge in expense and resolution. Focused Ion Beams (FIB) has been known for high resolution but low throughput work in TEM sample preparation, and its extremely well defined 7 nm diameter Ga beam make it als...

Focused Ion Beam (FIB) Circuit Edit

Introduction While focused ion beam (FIB) circuit edit has been used for quite some time on older process nodes, it now offers even more important benefits as the industry migrates to smaller technologies. The stakes are rising at 28 nm and beyond, and it can now cost $10 million or more to bring a device to market. Manufacturers looking to mitigate risk are using FIB circuit edit to reduce cos...